SIMS Depth Profiling of Na in SiO2 Films by Chemical Etching with HF Solution.
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چکیده
منابع مشابه
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ژورنال
عنوان ژورنال: Hyomen Kagaku
سال: 1995
ISSN: 0388-5321,1881-4743
DOI: 10.1380/jsssj.16.530